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Oxide semiconductor single crystal and its manufacturing method, transparent conductive material, and transparent conductive substrate

机译:氧化物半导体单晶及其制造方法,透明导电材料和透明导电基板

摘要

PROBLEM TO BE SOLVED: To provide: an oxide semiconductor single crystal having a larger size compared with a conventional single crystal having a micron order size and having a high occupancy of 1:1:1:4 phase crystal (InGaZnO); a method for manufacturing the same; a transparent conductive material; and a transparent conductive substrate.SOLUTION: The method for manufacturing an oxide semiconductor single crystal includes the step of manufacturing the oxide semiconductor single crystal having a composition represented by (InGaO)(ZnO)(m≥1, n≥1, m, n: an integer) by heating a sample rod including indium, gallium and zinc at a molar ratio represented by In:Ga:Zn=1:1:a (a>1) at a pressure of more than 1 atmosphere in an oxygen containing atmosphere by a floating zone method and cooling a melt formed by the heating.SELECTED DRAWING: Figure 2A
机译:要解决的问题:提供:与具有微米级尺寸的常规单晶相比,氧化物半导体单晶具有更大的尺寸,具有1:1:1:4相结晶(Ingazno)的高占用率。 制造方法的方法; 透明导电材料; 和透明导电底物。溶液:制造氧化物半导体单晶的方法包括制造具有(ingao)(ZnO)表示的组合物(ZnO)(m≥1,n≥1,m,n的组合物的步骤 :通过在含氧气氛中超过1大气的压力下加热包括铟,镓和锌的样品棒,包括以In:Ga:Zn = 1:1:a(a> 1)表示的摩尔比例的样品棒 通过浮动区域方法和通过加热形成的熔体。选择图:图2A

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