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VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS
VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS
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机译:汽相淀积的CARBON-DOPED金属氧化物使用光阻
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摘要
Embodiments disclosed herein include a method of forming a metal-oxo photoresist on a substrate. In an embodiment, the method comprises repeating a deposition cycle, where each iteration of the deposition cycle comprises: a) flowing a metal precursor into a chamber comprising the substrate; and b) flowing an oxidant into the chamber, where the oxidant and the metal precursor react to form the metal-oxo photoresist.
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