首页> 外国专利> Gas doping systems for controlled doping of a melt of semiconductor or solar-grade material

Gas doping systems for controlled doping of a melt of semiconductor or solar-grade material

机译:半导体或太阳能级材料熔体受控掺杂用气体掺杂系统

摘要

A crystal pulling apparatus for producing an ingot is provided. The apparatus includes a furnace and a gas doping system. The furnace includes a crucible for holding a melt. The gas doping system includes a feeding tube, an evaporation receptacle, and a fluid flow restrictor. The feeding tube is positioned within the furnace, and includes at least one feeding tube sidewall, a first end through which a solid dopant is introduced into the feeding tube, and an opening opposite the first end through which a gaseous dopant is introduced into the furnace. The evaporation receptacle is configured to vaporize the dopant therein, and is disposed near the opening of the feeding tube. The fluid flow restrictor is configured to permit the passage of solid dopant therethrough and restrict the flow of gaseous dopant therethrough, and is disposed within the feeding tube between the first end and the evaporation receptacle.
机译:本发明提供了一种用于生产铸锭的晶体拉伸装置。该装置包括熔炉和气体掺杂系统。熔炉包括一个坩埚,用于盛放熔体。该气体掺杂系统包括进料管、蒸发容器和流体限流器。进料管位于熔炉内,并包括至少一个进料管侧壁、将固体掺杂剂引入进料管的第一端以及与第一端相对的开口,气体掺杂剂通过该开口引入熔炉。蒸发容器被配置成蒸发其中的掺杂剂,并且被布置在进料管的开口附近。流体限流器被配置为允许固体掺杂剂通过并限制气体掺杂剂通过,并且被布置在第一端和蒸发容器之间的进料管内。

著录项

  • 公开/公告号US11299819B2

    专利类型

  • 公开/公告日2022-04-12

    原文格式PDF

  • 申请/专利权人 GLOBALWAFERS CO. LTD.;

    申请/专利号US201916519813

  • 申请日2019-07-23

  • 分类号C30B15/04;C30B29/06;C30B15/10;

  • 国家 US

  • 入库时间 2024-06-14 22:56:41

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号