METHOD FOR CHARACTERIZING A STRESS VARIATION IN A THIN FILM BY X-RAY DIFFRACTION

摘要

1. Method for characterizing a stress variation in a thin film comprising a) the application of a constant temperature capable of causing the thin film to pass from a first state to a second state, the passage from the first state to the second state generating stresses within thin film, b) determination of the stress variation in the film by measuring the width at mid-height βRC of the oscillation curve (rocking curve) by X-ray diffraction, from a series of diffraction measurements by X-ray diffraction at different times. No abstract figure.