DEVICE FOR PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION BY ALLOWING A DEPOSIT ON THE PLATE EDGES

摘要

A plate edge plasma assisted chemical vapor deposition device comprising a housing with an opening (2), a door for closing the opening (6), an air supply device (8.1) and an escape device (8.2) connected to the housing, and a generator (8),A suspension structure having at least one first stack of a plurality of plates in a housing configured to align the plates (P) with each other, A circuit for connecting a first board stack to a generator terminal (8) to form a first electrode, the device having at least one second electrode (56) arranged on one side of the first stack and connected to the other end of the generator (8).