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Heterojunction diode using 2D thin film insertion layer and manufacturing method thereof

机译:异质结二极管使用2D薄膜插入层及其制造方法

摘要

The present invention relates to a heterojunction diode using a 2D thin film insertion layer. A heterojunction diode using a 2D thin film insertion layer according to an embodiment of the present invention includes a first semiconductor layer that is a semiconductor, a 2D thin film insertion layer in which the 2D thin film material is formed in layers on the first semiconductor layer, and the 2D thin film insertion and a second semiconductor layer that is a semiconductor stacked on the layer. The heterojunction diode using this 2D thin film insertion layer has the effect of improving the reaction performance.
机译:异质结二极管技术领域本发明涉及使用2D薄膜插入层的异质结二极管。 根据本发明实施例的使用2D薄膜插入层的异质结二极管包括作为半导体的第一半导体层,2D薄膜插入层,其中2D薄膜材料在第一半导体层上形成层 和第二薄膜插入和第二半导体层是堆叠在层上的半导体。 使用该2D薄膜插入层的异质结二极管具有改善反应性能的效果。

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