首页> 外国专利> METHOD FOR CLEANING A SPUTTERING TARGET METHOD FOR MANUFACTURING A SPUTTERING TARGET METHOD FOR MANUFACTURING A RECYCLED INGOT AND A RECYCLED INGOT

METHOD FOR CLEANING A SPUTTERING TARGET METHOD FOR MANUFACTURING A SPUTTERING TARGET METHOD FOR MANUFACTURING A RECYCLED INGOT AND A RECYCLED INGOT

机译:清洁溅射靶法的制造溅射靶法,用于制造用于制造再生锭和再生锭的溅射靶法

摘要

A step of separating a target material from a target material of a sputtering target formed by bonding a target material mainly composed of metal and a support member with a bonding material, and a step of treating a bonding surface of the target material with the support member with a base. A method of cleaning the target material, including.
机译:通过将主要由金属和支撑构件构成的靶材料与具有粘合材料构成的目标材料分离由溅射靶的目标材料分离的步骤,以及用支撑构件处理目标材料的键合表面的步骤 有一个基地。 一种清洁目标材料的方法,包括。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号