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ETCHANT COMPOSITION FOR SILVER THIN LAYER AND ETCHING METHOD AND METHOD FOR FABRICATION METAL PATTERN USING THE SAME
ETCHANT COMPOSITION FOR SILVER THIN LAYER AND ETCHING METHOD AND METHOD FOR FABRICATION METAL PATTERN USING THE SAME
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机译：用于银薄层的蚀刻剂组合物和蚀刻方法和使用该蚀刻方法和制造金属图案的方法
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摘要
The present invention provides (A) nitric acid, (B) an alkylsulfonic acid having 1 to 3 carbon atoms, (C) an organic acid other than an alkylsulfonic acid having 1 to 3 carbon atoms, (D) sulfate, (E) a triple metal salt including iron, and ( F) It relates to a silver thin film etchant composition containing water, an etching method using the same, and a method of forming a metal pattern.
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