ETCHANT COMPOSITION FOR SILVER THIN LAYER AND ETCHING METHOD AND METHOD FOR FABRICATION METAL PATTERN USING THE SAME

摘要

The present invention is based on the total weight of the composition (A) 1 to 20% by weight of nitric acid; (B) 25 to 60% by weight of an organic acid; (C) 0.01 to 0.09 weight percent of a metal oxidizer; (D) 1 to 20% by weight of nitrate; And it relates to a silver thin film etchant composition comprising a residual amount of (E) water such that the total weight of the composition is 100% by weight, an etching method using the same, and a method of forming a metal pattern.