A method for examining a sample using an array of primary charged particle beamlets, a charged particle beam device for examining a sample using an array of primary charged particle beamlets, and a multi-column microscope for examining a sample

摘要

A method for inspecting a sample using an array of primary charged particle beamlets in a charged particle beam device having an optical axis is disclosed. The method includes generating a beam of primary charged particles; illuminating the multi-aperture lens plate with a primary charged particle beam to create an array of primary charged particle beamlets; and correcting the field curvature of the charged particle beam device using the first and second field curvature correction electrodes. The method further includes applying a voltage to the first and second field curvature correction electrodes. At least one of the field strengths provided by the first and second field curvature correction electrodes varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further comprises focusing the primary charged particle beamlets onto discrete locations on the sample using the objective lens.