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PRETREATMENT DEVICE FOR REGENERATION OF SPECIAL GAS USED IN SEMICONDUCTOR MANUFACTURING PROCESS AND PRETREATMENT METHOD THEREOF
PRETREATMENT DEVICE FOR REGENERATION OF SPECIAL GAS USED IN SEMICONDUCTOR MANUFACTURING PROCESS AND PRETREATMENT METHOD THEREOF
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机译:用于半导体制造工艺的特殊气体再生的预处理装置及其预处理方法
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摘要
The pretreatment device for regenerating a special gas used in a semiconductor manufacturing process according to an embodiment of the present invention receives a gas that has undergone a pre-purification treatment with respect to the exhaust gas in which the special gas is diluted from the semiconductor manufacturing process, and CH4 and CF4 a catalyst processing chamber for decomposing at least one of; a heating chamber provided at the front end of the catalyst treatment chamber to increase the temperature of the gas introduced into the catalyst treatment chamber; It is provided at the front end of the heating chamber and heat exchanges between the pre-purified gas and the return gas discharged from the catalyst treatment chamber to increase the temperature of the pre-purified gas and deliver it to the heating chamber, and the return gas is 1 car cooling heat exchanger; a cooling chamber for secondarily cooling the return gas cooled primarily by the heat exchanger; an adsorption unit for removing at least one of HF, F2, CO, CO2 and H2O from the secondary cooled gas discharged from the cooling chamber; and a fan that maintains the operating pressure and delivers the exhaust gas from the adsorption unit to the gas regeneration system.
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