CVD reactor with means to locally influence susceptor temperature

摘要

The present invention relates to a device and method for thermal treatment of substrates using a susceptor (5), which is heated with a heater (13) and driven rotationally about an axis of rotation (A) by a rotary drive (20) and holds at least one stall. Means 14 , 14 ′; 15 , 16 are connected to or to the susceptor 5 in a locally limited manner synchronized with the rotational movement of the susceptor 5 to equalize the local temperature difference of the rotating susceptor 5 . It is provided to influence the heat transfer from the susceptor 5 . In particular, a temperature control gas whose heat conduction properties change is periodically supplied in a pulsed manner periodically to the gap 10 between the susceptor 5 and the cooling unit 30 through the supply opening 14 ′.