首页> 外国专利> MANUFACTURING APPARATUS AND METHOD FOR PARYLENE LAYER WITH REAL-TIME MONITORING FOR THICKNESS OF PARYLENE LAYER

MANUFACTURING APPARATUS AND METHOD FOR PARYLENE LAYER WITH REAL-TIME MONITORING FOR THICKNESS OF PARYLENE LAYER

机译:对二甲苯层的制造装置和方法,具有对二甲苯厚度的实时监测

摘要

The present invention relates to an apparatus and method for producing a parylene layer capable of real-time thickness monitoring. More specifically, it relates to an apparatus and method for producing a parylene layer capable of real-time thickness monitoring for calculating the thickness of a deposited parylene layer using an impedance value of the parylene layer. The apparatus for producing a parylene layer capable of real-time thickness monitoring according to the present invention includes a deposition chamber, a sensor unit disposed in the deposition chamber, and parylene deposited on the sensor unit in the deposition chamber through the sensor unit. Parylene) layer is deposited based on the impedance analysis unit measuring the impedance of the layer and the information on the impedance of the parylene layer measured by the impedance analysis unit and the information about the reference thickness and the reference impedance of the parylene layer stored in advance It may include a calculation unit for calculating the thickness of the parylene layer.
机译:本发明涉及一种用于制造能够实时厚度监测的聚对二甲苯层的装置和方法。更具体地,它涉及一种用于制备能够使用聚对二甲苯层的阻抗值计算沉积的二甲苯层的厚度的实时厚度监测的聚对二甲苯层的装置和方法。根据本发明的用于制造能够进行实时厚度监测的聚对聚丙烯层的装置包括沉积室,设置在沉积室中的传感器单元,并且通过传感器单元在沉积室中的传感器单元上​​沉积的聚对聚乙烯。基于阻抗分析单元沉积聚丙烯)层,其测量层的阻抗以及由阻抗分析单元测量的聚对二甲苯层的阻抗的信息以及关于存储在的聚对叶片层的参考厚度和参考阻抗的信息前进它可以包括用于计算聚对甲肾值的厚度的计算单元。

著录项

  • 公开/公告号KR102318403B1

    专利类型

  • 公开/公告日2021-10-26

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020190078661

  • 申请日2019-07-01

  • 分类号C23C16/52;C23C16/44;G01N27/02;G01N27/04;G05D5/02;

  • 国家 KR

  • 入库时间 2024-06-14 22:16:47

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