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SELECTIVE-AREA GROWTH OF III-V MATERIALS FOR INTEGRATION WITH SILICON PHOTONICS

机译:用硅光子学集成III-V材料的选择区生长

摘要

Embodiments provide for selective-area growth of III-V materials for integration with silicon photonics. The resulting platform includes a substrate; an insulator, extending a first distance from the substrate, including a passive optical component at a second distance from the substrate less than the first distance, and defining a pit extending to the substrate; and a III-V component, extending from the substrate within in the pit defined in the insulator, the III-V component including a gain medium included at the second distance from the substrate and optically coupled with the passive optical component. The pit may define an Optical Coupling Interface between the III-V component and the passive optical component, or a slit defined between the III-V component and the passive optical component may define the Optical Coupling Interface.
机译:实施方案提供III-V材料的选择性面积生长,用于与硅光子集成。 得到的平台包括基板; 绝缘体,距基板延伸第一距离,包括距基板的第二距离的无源光学元件小于第一距离,并限定延伸到基板的凹坑; 和一个III-V组分,从绝缘体中限定的凹坑内延伸的III-V组分,III-V组分包括包括在距基板的第二距离处的增益介质,并与无源光学部件光学耦合。 该凹坑可以在III-V部件和无源光学部件之间定义光学耦合界面,或者在III-V部件和无源光学元件之间限定的狭缝可以限定光学耦合界面。

著录项

  • 公开/公告号US2021265806A1

    专利类型

  • 公开/公告日2021-08-26

    原文格式PDF

  • 申请/专利权人 CISCO TECHNOLOGY INC.;

    申请/专利号US202117302099

  • 申请日2021-04-23

  • 分类号H01S5/026;G02B6/122;H01S5/343;G02B6/136;H01S5/10;G02B6/13;H01S5/028;H01S5/02;

  • 国家 US

  • 入库时间 2022-08-24 20:47:38

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