首页> 外国专利> A method for making a substrate water repellent, a surface treatment agent, and a method for suppressing the collapse of an organic pattern or an inorganic pattern when cleaning the substrate surface with a cleaning liquid.

A method for making a substrate water repellent, a surface treatment agent, and a method for suppressing the collapse of an organic pattern or an inorganic pattern when cleaning the substrate surface with a cleaning liquid.

机译:用清洁液清洁基板表面时,制备基板防水剂,表面处理剂和用于抑制有机图案的塌陷或无机图案的方法。

摘要

A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface treatment agent, the surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom. A surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent (A) including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom.
机译:一种赋予衬底防水性的方法; 该方法中使用的表面处理剂; 以及用于抑制用清洁液清洁基板表面的有机或无机图案的塌陷的方法。 该方法包括将基材的表面暴露于表面处理剂,表面处理剂,包括水排斥剂和含氮杂环化合物,水排斥剂,包括含有疏水基团的烷氧基硅烷化合物与硅粘合 原子。 一种表面处理剂,包括水排斥剂和含氮杂环化合物,水排斥剂(a),包括具有邻硅原子的疏水基团的烷氧基硅烷化合物。

著录项

  • 公开/公告号JP6916731B2

    专利类型

  • 公开/公告日2021-08-11

    原文格式PDF

  • 申请/专利权人 東京応化工業株式会社;

    申请/专利号JP20170254853

  • 发明设计人 関 健司;並木 拓海;

    申请日2017-12-28

  • 分类号C09K3/18;G03F7/40;

  • 国家 JP

  • 入库时间 2022-08-24 20:31:36

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