首页> 外国专利> Method for imparting water repellency to substrate, surface treatment agent, and method for suppressing collapse of organic pattern or inorganic pattern in cleaning substrate surface with cleaning liquid

Method for imparting water repellency to substrate, surface treatment agent, and method for suppressing collapse of organic pattern or inorganic pattern in cleaning substrate surface with cleaning liquid

机译:用清洁液用清洁基板表面抑制衬底,表面处理剂和抑制有机图案或无机图案塌陷的方法的方法

摘要

A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface treatment agent, the surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom. A surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent (A) including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom.
机译:一种赋予衬底防水性的方法;该方法中使用的表面处理剂;以及用于抑制用清洁液清洁基板表面的有机或无机图案的塌陷的方法。该方法包括将基材的表面暴露于表面处理剂,表面处理剂,包括水排斥剂和含氮杂环化合物,水排斥剂,包括含有疏水基团的烷氧基硅烷化合物与硅粘合原子。一种表面处理剂,包括水排斥剂和含氮杂环化合物,水排斥剂(a),包括具有邻硅原子的疏水基团的烷氧基硅烷化合物。

著录项

  • 公开/公告号US10988649B2

    专利类型

  • 公开/公告日2021-04-27

    原文格式PDF

  • 申请/专利权人 TOKYO OHKA KOGYO CO. LTD.;

    申请/专利号US201816229883

  • 发明设计人 KENJI SEKI;TAKUMI NAMIKI;

    申请日2018-12-21

  • 分类号C09K3/18;G03F7/075;H01L21/02;G03F7/20;C09D7/63;G03F7/40;G03F7/16;C09D5;C08K5/3472;C08K5/3445;C08K5/5419;

  • 国家 US

  • 入库时间 2022-08-24 18:23:43

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