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Power integrated device, and electronic device and electronic system having the power integrated device

机译:功率集成设备,以及具有电力集成设备的电子设备和电子系统

摘要

The power integrated device includes a semiconductor layer of a first conductivity type, a source region and a drain region of a second conductivity type disposed to be spaced apart from each other on the upper portion of the semiconductor layer, and a second portion disposed to surround the drain region on the upper portion of the semiconductor layer. a second conductivity-type first drift region and a second semiconductor layer disposed on the semiconductor layer between the source region and the first drift region, one side contacting the side of the first drift region and having an impurity concentration lower than the impurity concentration of the first drift region a gate insulating layer disposed over the drift region, a channel region between the source region and the second drift region and extending over the second drift region by a predetermined length; a field insulating plate having a planar structure disposed on it and extending over the drain region by a predetermined length, and a gate conductive layer pattern disposed on the gate insulating layer and disposed to extend over the field insulating plate.
机译:功率集成装置包括第一导电类型的半导体层,第二导电类型的源区和漏极区域设置成彼此间隔在半导体层的上部间隔开,并且第二部分设置为环绕漏区在半导体层的上部。第二导电类型的第一漂移区和设置在源区和第一漂移区域之间的半导体层上的第二半导体层,一侧接触第一漂移区域的一侧并具有低于杂质浓度的杂质浓度第一漂移区域设置在漂移区域上的栅极绝缘层,源区和第二漂移区域之间的沟道区,并在第二漂移区上延伸预定长度;具有平面结构的场绝缘板,平面结构设置在栅极绝缘层上并设置在栅极绝缘层上并设置成延伸到漏极区域上并设置成延伸以延伸到漏极区域上并设置成延伸以延伸到阀门绝缘板上。

著录项

  • 公开/公告号KR102286012B1

    专利类型

  • 公开/公告日2021-08-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020150024488

  • 发明设计人 김대훈;이상현;

    申请日2015-02-17

  • 分类号H01L29/66;H01L29/78;

  • 国家 KR

  • 入库时间 2024-06-14 21:55:14

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