SURFACE TREATMENT METHOD OF BUFFER LAYER FOR FLEXIBLE SUBSTRATE

摘要

The present invention discloses a surface treatment method of a buffer layer for a flexible substrate for satisfying the characteristics required for a flexible display by ensuring planarization and high density of the buffer layer. A method for surface treatment of a buffer layer for a flexible substrate according to the present invention comprises the steps of: (a) providing a flexible substrate; (b) forming a buffer layer on the flexible substrate; and (c) a surface treatment step of imparting planarization to the surface of the buffer layer by irradiating an electron beam that induces atomic rearrangement to the surface of the buffer layer.