首页> 外国专利> WAFER WORKPIECE, PROVISIONAL ADHESIVE MATERIAL FOR WAFER WORKING, AND THIN WAFER MANUFACTURING METHOD

WAFER WORKPIECE, PROVISIONAL ADHESIVE MATERIAL FOR WAFER WORKING, AND THIN WAFER MANUFACTURING METHOD

机译:晶圆工件,临时粘合材料的晶片工作,薄晶片制造方法

摘要

The present invention provides a wafer processing body in which a temporary adhesive layer is formed on a support, and a wafer having a circuit surface on the surface and a back surface to be processed is laminated on the temporary adhesive layer, wherein the temporary adhesive layer is A first temporary adhesive layer consisting of a thermoplastic organopolysiloxane polymer layer (A) releasably adhered to the surface of the wafer, and a second temporary consisting of a thermosetting siloxane-modified polymer layer (B) that is peelably laminated on the first temporary adhesive layer A wafer having a composite temporary adhesive layer having a three-layer structure of an adhesive layer and a third temporary adhesive layer comprising a thermosetting siloxane polymer layer (C) that is peelably laminated on the second temporary adhesive layer and peelably adhered to the support It is a processed object. Accordingly, there is provided a temporary adhesive material for wafer processing that is easy to perform temporary adhesion and peeling, and which can be easily peeled even when the thin wafer before peeling is cut, and a wafer processing body capable of increasing the productivity of the thin wafer.
机译:本发明提供一种晶片处理体,其中在支撑件上形成临时粘合剂层,并且在临时粘合剂层上层叠具有待处理的表面和背面的电路表面的晶片,其中临时粘合剂层是由可释放到晶片表面的热塑性有机聚硅氧烷聚合物层(A)组成的第一临时粘合剂层,以及由热固性硅氧烷改性的聚合物层(B)组成的第二临时,其在第一临时粘合剂上可剥离地层压层晶片具有具有具有粘合剂层的三层结构的复合临时粘合剂层的晶片和包含热固性硅氧烷聚合物层(c)的三层结构,其可剥离地层叠在第二临时粘合剂层上并剥离地粘附在载体上它是一个处理的对象。因此,提供了一种用于晶片处理的临时粘合材料,其易于执行临时粘附和剥离,并且即使在切割之前的薄晶片时也可以容易地剥离,以及能够提高生产率的晶片加工体薄晶片。

著录项

  • 公开/公告号KR102268248B1

    专利类型

  • 公开/公告日2021-06-24

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020167020763

  • 发明设计人 타가미 쇼헤이;수고 미치히로;

    申请日2015-01-21

  • 分类号C09J7/20;C09J183/04;C09J183/14;H01L21/683;

  • 国家 KR

  • 入库时间 2022-08-24 19:50:33

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