首页> 外国专利> Vapor phase corrosion cavity capable of adjusting internal pressure difference and vapor phase corrosion method using it

Vapor phase corrosion cavity capable of adjusting internal pressure difference and vapor phase corrosion method using it

机译:能够调节内部压力差和气相腐蚀方法的气相腐蚀腔

摘要

The present invention includes an upper cavity, a lower cavity, and a lifting control device, wherein the lifting control device is connected to the upper cavity so as to control vertical movement of the upper cavity, the lower cavity is fixed, and The lower cavity is provided with a cavity inlet port and a cavity outlet port, and is a vapor-phase corrosion cavity capable of adjusting the pressure difference between the inside and outside, and is connected to the cavity exhaust port of the lower cavity, and the pressure difference between the inside and outside of the vapor-phase corrosion cavity is controlled. Disclosed is a vapor-phase corrosion cavity having an adjustable internal and external pressure difference, which further includes an adjustable cavity suction force control device. The vapor-phase corrosion cavity according to the present invention capable of adjusting the pressure difference between the inside and the outside keeps the balance between the pressure inside and outside the cavity and avoids damage to the cavity made of a non-metallic material. The present invention further discloses a method of vapor-depositing a wafer by a vapor-deposition cavity capable of adjusting the pressure difference between the inside and the outside. [Selection diagram] Fig. 4
机译:本发明包括上腔,下腔和升降控制装置,其中提升控制装置连接到上腔,以控制上腔的垂直运动,下腔固定,较低的腔设置有腔入口和腔出口端口,并且是一种能够调节内部和外部之间的压力差的气相腐蚀腔,并且连接到下腔的腔排气口和压力差控制气相腐蚀腔的内部和外部之间。公开了一种具有可调节的内部和外部压力差的气相腐蚀腔,其进一步包括可调节的腔吸力控制装置。根据本发明的气相腐蚀腔能够调节内部和外部之间的压力差,可以保持腔内和外部的压力之间的平衡,并且避免损坏由非金属材料制成的空腔。本发明还公开了一种通过蒸汽沉积腔蒸汽沉积晶片的方法,其能够调节内部和外部之间的压力差。 [选择图]图4

著录项

  • 公开/公告号JP6900135B2

    专利类型

  • 公开/公告日2021-07-07

    原文格式PDF

  • 申请/专利权人 江蘇魯▲もん▼儀器有限公司;

    申请/专利号JP20190571416

  • 发明设计人 許 開東;

    申请日2018-06-28

  • 分类号H01L21/302;H01L21/683;

  • 国家 JP

  • 入库时间 2022-08-24 19:45:03

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