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Conductive high toughness oxides deposited by plasma spray—physical vapor deposition (PS-PVD)
Conductive high toughness oxides deposited by plasma spray—physical vapor deposition (PS-PVD)
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机译:通过等离子体喷雾物理气相沉积沉积的导电高韧性氧化物(PS-PVD)
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摘要
Oxide coatings deposited by plasma spray-physical vapor deposition (PS-PVD) can be processed to be mechanically tough (erosion resistant) and electrically conductive at room temperature. The electrically conductive phase contained within the oxide (MO2) coatings is a metastable suboxide (MO) that has not been formed in significant volume under any other known methods. Content of the electrically conductive phase can be varied in addition to the microstructure, which can be columnar, planar, or a combination of the two depending on the processing conditions. Upon exposing the material to moderate temperatures (>300° C.), the metastable phase is further oxidized (to MO2), and the material becomes insulating, but retains its high toughness and microstructure.
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