TEMPLATE FOR IMPRINT LITHOGRAPHY INCLUDING A RECESSION, AN APPARATUS OF USING THE TEMPLATE, AND A METHOD OF FABRICATING AN ARTICLE

摘要

A template for imprint lithography may include a body. The body includes a base surface and may have a depression extending from the base surface lying along the base plane, the depression including a major portion having tapered sidewalls. In a particular embodiment, the depression comprises an intermediate portion having an intermediate sidewall. The middle sidewall is round, or at least a portion of the middle sidewall lies at a different angle compared to the average tapering angle of the main part. In another aspect, a method of manufacturing a semiconductor device includes forming a patterned resist layer having tapered sidewalls over a substrate having the device layer; patterning the device layer using the patterned resist layer; and etching at least a portion of the device layer to expose a lateral portion of the at least a portion of the device layer. The template is well suited for forming a 3D memory array.