TEMPLATE FOR IMPRINT LITHOGRAPHY INCLUDING A RECESSION AN APPARATUS OF USING THE TEMPLATE AND A METHOD OF FABRICATING AN ARTICLE

摘要

A template for imprint lithography of the present invention may comprise a main body. The main body may include a base surface and a recessed part extended from the base surface placed along a base plane, and the recessed part includes a main portion having a tapered sidewall. In exemplary embodiments, the recessed part includes an intermediate portion having an intermediate sidewall. The intermediate sidewall is round, or at least a portion of the intermediate sidewall is placed at an angle different from an average tapering angle of the main portion. In another aspect, a method of manufacturing a semiconductor device of the present invention comprises the steps of: forming a patterned resist layer having the tapered sidewall on a substrate with a device layer; patterning the device layer by using the patterned resist layer; and etching at least a portion of the device layer to expose a lateral direction part of the at least the portion of the device layer. The template is very suitable for forming a three-dimensional memory array.