PLASMA GENERATION DEVICE, SUBSTRATE PROCESSING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, PROGRAM, PLASMA GENERATION METHOD, ELECTRODE, AND REACTION TUBE

摘要

It provides a technique that can determine abnormalities in plasma. Using an imaging device disposed in the processing chamber, the gas supply port for supplying the plasmaized gas in the processing chamber is imaged, based on the imaged image of the gas supply port, the emission intensity of plasma is detected, and the detected emission intensity On the basis of, a technique for determining at least one of the presence or absence of occurrence of an abnormal discharge of the plasma and the occurrence of flicker is provided.