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HIGH POWER GALLIUM NITRIDE ELECTRONICS USING MISCUT SUBSTRATES
HIGH POWER GALLIUM NITRIDE ELECTRONICS USING MISCUT SUBSTRATES
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机译:使用剪切基材的高功率氮化镓电子器件
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摘要
The electronic device has a hexagonal crystal structure, And a III-V substrate having a normal to the growth surface with a misalignment from the direction of 0.15° to 0.65°. The electronic device also includes a first epitaxy layer connected to the III-V substrate and a second epitaxy layer connected to the first epitaxy layer. The electronic device further includes a first contact in electrical contact with the substrate and a second contact in electrical contact with the second epitaxy layer.
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