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Device to improve the mobility of carriers in a MOSFET channel on silicon carbide

机译:改善碳化硅电磁体在MOSFET通道中载流子的移动性的装置

摘要

The present invention relates to a MOSFET device arranged on a substrate 10, comprising first and second heavily doped strips 11 and 14 covered with first and second contacts 13 and 15, respectively. The two strips are spaced apart by a channel 18 that also appears on the substrate 10, the channel being covered by a dielectric layer 20, and a third contact portion 21 lying thereon. The device is characterized in that a low concentration doped thin film 19 is incorporated at the interface between the channel 18 and the dielectric layer 20, and the doped elements are distributed on both sides of the interface.
机译:本发明涉及一种布置在基板10上的MOSFET装置,包括分别覆盖有第一和第二触点13和15的第一和第二掺杂条11和14。两个条带由沟道18间隔开,该通道18也出现在基板10上,沟道被介电层20覆盖,并且第三接触部分21在其上覆盖。该装置的特征在于,在通道18和介电层20之间的界面处并入低浓度掺杂的薄膜19,并且掺杂元件分布在界面的两侧。

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