THREE-DIMENSIONAL MICRO-NANO STRUCTURE PHOTOETCHING SYSTEM AND METHOD THEREFOR

摘要

A three-dimensional micro-nano structure photoetching system and a three-dimensional micro-nano structure photoetching method, the system comprising: a digital mask apparatus (11), a spatial light modulator (12), a projection objective lens (13) and a workbench (14), wherein the digital mask apparatus (11) is electrically connected to the spatial light modulator (12), the projection objective lens (13) is arranged between the spatial light modulator (12) and the workbench (14), and the workbench (14) is used for fixing a substrate (21) to be photoetched; the digital mask apparatus (11) is used for generating a digital mask (101), the digital mask (101) comprises a pattern exposure area (101a), and the digital mask apparatus (11) uploads the digital mask (101) to the spatial light modulator (12); the spatial light modulator (12) is used to display the digital mask (101), and the height of light hitting the pattern exposure area (101a) of the projection objective lens (13) after the light passes through the pattern exposure area (101a) on the spatial light modulator (12) is proportional to an exposure dose; and the projection objective lens (13) projects pattern light on the substrate (21), and the workbench (14) drives the substrate (21) to move along a set path in the plane for exposure. The three-dimensional micro-nano structure photoetching system is simple in structure, high in precision, low in cost, and fast and efficient.