Negative type photosensitive siloxane composition, and curing film using the same and manufacturing method of the electronic element

摘要

Problem to be solved: to provide a negative type photosensitive siloxane composition capable of forming a hardened film having excellent heat resistance and crack limit film thickness.In accordance with the present invention, a negative type photosensitive siloxane composition containing polysiloxane with particular content of silanol, a specific Photobase generator particle, and a solvent is provided. The content of silanol is measured by FT-IR.No selection