首页> 外国专利> Liquid discharge device, nanoimprint device, liquid storage tank for nanoimprint, cured product pattern manufacturing method, optical component manufacturing method, circuit board manufacturing method, imprint mold manufacturing method

Liquid discharge device, nanoimprint device, liquid storage tank for nanoimprint, cured product pattern manufacturing method, optical component manufacturing method, circuit board manufacturing method, imprint mold manufacturing method

机译:液体排放装置,纳米压印装置,纳米压印液体储罐,固化产品图案制造方法,光学元件制造方法,电路板制造方法,压印模具制造方法

摘要

To suppress the increase in concentrations of metal impurities, particles, and water in a nanoimprint liquid contained in a containing part with time.SOLUTION: A liquid discharging device 1 comprises: a containing part 8 for containing a nanoimprint liquid 9; and a discharge opening 10 communicating with the containing part 8 and serving to discharge the nanoimprint liquid 9. The liquid discharging device 1 has, in the containing part 8, an adsorbing/absorbing body 23 for adsorbing or absorbing at least one kind selected from a group consisting of particles, metal ions and water. The liquid discharging device is arranged so that the adsorbing/absorbing body 23 is never discharged from the discharge opening 10 when discharging the nanoimprint liquid 9 from the discharge opening 10.SELECTED DRAWING: Figure 1
机译:为了抑制包含在含有的纳米压印液体中的金属杂质,颗粒和水的浓度增加。液体排放装置1包括:包含纳米视图液体9的含有部分8;和一个排出开口10与包含部分8连通并用于排出纳米视网膜9.液体排出装置1在容纳部分8中具有吸附/吸收体23,用于吸附或吸收选自的至少一种组由颗粒,金属离子和水组成。液体排出装置被布置成使得当从排放口排出纳米视网膜液9时,吸附/吸收体23从排出开口10排出10.如图1所示:图1

著录项

  • 公开/公告号JP6870066B2

    专利类型

  • 公开/公告日2021-05-12

    原文格式PDF

  • 申请/专利权人 キヤノン株式会社;

    申请/专利号JP20190227317

  • 发明设计人 伊藤 俊樹;坂本 和美;荒木 義雅;

    申请日2019-12-17

  • 分类号H01L21/027;B05C9/12;B05C11/10;B05C11;B05D7/24;B05D1/26;B05D3/12;B05D3/06;B29D11;B29C33/40;B29C59/02;H05K3/06;B05C5;

  • 国家 JP

  • 入库时间 2022-08-24 18:38:46

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