A showerhead unit, a substrate processing apparatus including the showerhead unit, and a method of assembling the showerhead unit

摘要

The present invention provides a shower head unit provided in an apparatus for processing a substrate using plasma. The shower head unit includes a gas injection plate for diffusing a gas supplied from an upper portion; And a shower head disposed under the gas injection plate and having a plurality of gas injection holes, wherein a protrusion extending from an upper surface thereof and protruding upward is formed in the shower head, and in a coupling hole formed in the gas injection plate The protrusion may be inserted.