COMPOSITION FOR DEPOSITING THIN FILM, MANUFACTURING METHOD FOR THIN FILM USING THE COMPOSITION, THIN FILM MANUFACTURED FROM THE COMPOSITION, AND SEMICONDUCTOR DEVICE INCLUDING THE THIN FILM

摘要

Organometallic compounds including strontium, barium, or a combination thereof; And a thin film deposition composition comprising at least one non-shared electron pair-containing compound represented by the following Formula 1, a method of manufacturing a thin film using the thin film deposition composition, and a thin film prepared from the thin film deposition composition, and the thin film It relates to a semiconductor device. [Formula 1] R 1 R 2 R 3 N In Formula 1, the definitions of R 1 to R 3 are as described in the specification.