首页> 外国专利> COMPOSITION FOR DEPOSITING THIN FILM, MANUFACTURING METHOD FOR THIN FILM USING THE COMPOSITION, THIN FILM MANUFACTURED FROM THE COMPOSITION, AND SEMICONDUCTOR DEVICE INCLUDING THE THIN FILM

COMPOSITION FOR DEPOSITING THIN FILM, MANUFACTURING METHOD FOR THIN FILM USING THE COMPOSITION, THIN FILM MANUFACTURED FROM THE COMPOSITION, AND SEMICONDUCTOR DEVICE INCLUDING THE THIN FILM

机译:用于沉积薄膜的组合物,使用该组合物的薄膜制造方法,由组合物制造的薄膜,以及包括薄膜的半导体器件

摘要

Disclosed are a composition for depositing a thin film including an organometallic compound including strontium, barium, or a combination thereof; and at least one unshared electron pair-containing compound represented by Chemical Formula 1, a method of manufacturing a thin film using the composition for depositing the thin film, and the thin film manufactured from the composition for depositing the thin film, and a semiconductor device including the thin film.
机译:公开了一种用于沉积包括有机金属化合物的薄膜的组合物,包括锶,钡或其组合;并且至少一种由化学式1表示的未共享的电子对化合物,使用用于沉积薄膜的组合物的制造薄膜的方法,以及由用于沉积薄膜的组合物和半导体器件制造的薄膜包括薄膜。

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