首页> 外国专利> Method of forming a GaN single crystal comprising disposing a nucleation center in a first region, a GaN source material in a second region, and establishing a temperature distribution

Method of forming a GaN single crystal comprising disposing a nucleation center in a first region, a GaN source material in a second region, and establishing a temperature distribution

机译:形成GaN单晶的方法,包括在第一区域中设置成核中心,第二区域中的GaN源材料,并建立温度分布

摘要

A method for growing a crystalline composition, the first crystalline composition may include gallium and nitrogen. The crystalline composition may have an infrared absorption peak at about 3175 cm−1, with an absorbance per unit thickness of greater than about 0.01 cm−1. In one embodiment, the composition ay have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the first crystalline composition.
机译:一种生长结晶组合物的方法,第一结晶组合物可包括镓和氮。结晶组合物可具有约3175cm -1-sup>的红外吸收峰,每单位厚度大于约0.01cm -1 / sop>的吸光度。在一个实施方案中,组合物Ay的浓度为每立方厘米小于约3×10 18-/ sup>的浓度的氧气量,并且可以在确定的体积中不含二维平面边界缺陷第一种结晶组合物。

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