首页>
外国专利>
PATTERN-TO-DESIGN ALIGNMENT FOR ONE-DIMENSIONAL UNIQUE STRUCTURES
PATTERN-TO-DESIGN ALIGNMENT FOR ONE-DIMENSIONAL UNIQUE STRUCTURES
展开▼
机译:用于一维唯一结构的模式与设计对齐
展开▼
页面导航
摘要
著录项
相似文献
摘要
Care areas for a first image of a die can be determined according to a 1D offset correction. The 1D offset correction can be based on 1D offsets between the first image and a second image for each of the image frames and also can be based on 1D offsets between a design and the second image for each of the image frames. The care areas can have a zero border for a dimension that is aligned to the design and a legacy border for the other dimension.
展开▼