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Electron beam irradiation device and its manufacturing method

机译:电子束辐射装置及其制造方法

摘要

An electron beam irradiation device (1) includes a vacuum chamber (2) having an electron beam generator (21) inside, a vacuum nozzle (3), and a window foil (4) on a tip of the vacuum nozzle (3). The electron beam irradiation device (1) further includes an outer pipe (7) surrounding the vacuum nozzle (3), a cooling-gas supply unit (9) that supplies cooling gas (C) into a coolant passage (8) formed between the vacuum nozzle (3) and the outer pipe (7), and a heat-conducting transmission foil (6) fitted to the window foil (4) and contacting the tip of the vacuum nozzle (3). The heat-conducting transmission foil (6) has a value of at least 63 × 10-3, which is determined by dividing a thermal conductivity [W/(m·K)] by a density [kg/m3], and a tip part of the vacuum nozzle (3) is made of a material having at least a thermal conductivity of copper.
机译:电子束照射装置(1)包括真空室(2),该真空室(2)具有内部的电子束发生器(21),真空喷嘴(3)和真空喷嘴尖端的窗箔(4)。电子束照射装置(1)还包括围绕真空喷嘴(3)的外管(7),冷却气供应单元(9),其将冷却气体(C)供应到形成在所述的冷却剂通道(8)中。真空喷嘴(3)和外管(7),以及装配到窗箔(4)并接触真空喷嘴(3)的尖端的导热透射箔(6)。导热透射箔(6)具有至少63×10 -3 / sup>的值,该值通过将导热率[w /(m·k)]除以密度[kg / m 3 ],真空喷嘴(3)的尖端部分由具有至少具有铜的导热率的材料制成。

著录项

  • 公开/公告号JP6843023B2

    专利类型

  • 公开/公告日2021-03-17

    原文格式PDF

  • 申请/专利权人 日立造船株式会社;

    申请/专利号JP20170174435

  • 发明设计人 田中 龍太;坂井 一郎;野田 武史;

    申请日2017-09-12

  • 分类号G21K5;G21K5/04;A61L2/08;B01J19/12;

  • 国家 JP

  • 入库时间 2022-08-24 17:44:27

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