Material for impregnation method, method for forming metal containing film, etching method and method for treating resin body

摘要

Problem to be solved: to provide a material for impregnation without forming a metal containing film having high etching resistance and without spontaneous ignition.Solution: an impregnated raw material containing at least one compound selected from the group consisting of the compounds represented by the general formulas (1) and (2).In formula (R1), R1 and R2 each independently represent an alkyl group of 1 to 4 carbon atoms and ml represents hafnium or zirconium.(R3 and R4 each represent an alkyl group of 1 to 4 carbon atoms independently, and R5 represents an alkyl group of 1 to 4 carbon atoms, while M2 represents hafnium or zirconium.)No selection