CERAMIC SHOWERHEAD WITH EMBEDDED RF ELECTRODE FOR CAPACITIVELY COUPLED PLASMA REACTOR

摘要

A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. The face plate is connected adjacent to the first surface of the back plate and includes a gas diffusion surface. The electrodes are arranged in one of the back plate and the face plate and are connected with one or more conductors. The gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and face plate are made of a non-metallic material.