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A SEMICONDUCTOR DEVICE HAVING MICROELECTROMECHANICAL SYSTEMS DEVICES WITH IMPROVED CAVITY PRESSURE UNIFORMITY

机译:具有具有改进的腔压力均匀性的微机电系统装置的半导体器件

摘要

Various embodiments of the present disclosure are directed towards a semiconductor device. The semiconductor device includes an interconnect structure disposed over a semiconductor substrate. A dielectric structure is disposed over the interconnect structure. A plurality of cavities are disposed in the dielectric structure. A microelectromechanical system (MEMS) substrate is disposed over the dielectric structure, where the MEMS substrate comprises a plurality of movable membranes, and where the movable membranes overlie the cavities, respectively. A plurality of fluid communication channels are disposed in the dielectric structure, where each of the fluid communication channels extend laterally between two neighboring cavities of the cavities, such that each of the cavities are in fluid communication with one another.
机译:本公开的各种实施例涉及半导体器件。半导体器件包括设置在半导体衬底上的互连结构。介电结构设置在互连结构上。多个空腔设置在介电结构中。微机电系统(MEMS)衬底设置在介电结构上,其中MEMS基板包括多个可动膜,并且可移动膜分别覆盖腔。多个流体通信通道设置在介电结构中,其中每个流体连通通道横向在腔的两个相邻空腔之间横向延伸,使得每个腔体彼此流体连通。

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