Substrate conveying mechanism of vapor phase growth apparatus

摘要

Problem to be solved: to provide a substrate transport mechanism of a vapor phase growth apparatus in which semiconductor yield is good without preventing uniform film formation of semiconductor crystals.Substrate transport mechanism of vapor phase growth apparatusA substrate table 17 for covering a circular hole portion is provided at the substrate delivery position of the susceptorAbove the substrate delivery positionHaving a plurality of claw portions 19A capable of supporting the outer periphery of the substrateUpper and lower upper chuck with upper and lower cylindersUnder the substrate delivery positionHold the board mount from belowIt comprises a lower chuck which can be moved up and down by a lower lift cylinder.Substrate support 17 isA base part 17a having a larger diameter than a circular hole portion andProtruding above the baseA cylindrical platform having a diameter corresponding to the substrate;At the position corresponding to claw portion 19A of upper chuckA mounting portion 17b having a cutting part 17D having a side cut off the side of the cylinder andProtruding below the baseA cylindrical portion 17c having a smaller outer diameter than the circular hole portion is providedDiagram