首页> 外国专利> INSULATED GATE FIELD-EFFECT TRANSISTOR WITH OPPOSITE-TYPE GATE CONNECTED REGION INSET IN SOURCE OR DRAIN

INSULATED GATE FIELD-EFFECT TRANSISTOR WITH OPPOSITE-TYPE GATE CONNECTED REGION INSET IN SOURCE OR DRAIN

机译:带有源极或漏极对向型门极连接区域的绝缘门极场效应晶体管

摘要

An IGFET with diffused source and drain regions of one conductivity type has formed in one of these regions a further diffused region, of the opposite conductivity type. The further region is directly connected to the gate electrode. In use as a Miller integrator with square wave input and saw tooth output the (reverse-biased) junction provided by the further region and the region (drain) containing it is used as the feedback capacitor. In use as an amplifier the region containing the further region is the source and the reverse-biased junction formed by the further region acts as a protective diode in a parallel with the gate insulation.
机译:具有一种导电类型的扩散的源极和漏极区域的IGFET在这些区域之一中形成了具有相反导电类型的另一扩散的区域。另一区域直接连接到栅电极。用作具有方波输入和锯齿输出的Miller积分器时,由另一个区域和包含该区域的区域(漏极)提供的(反向偏置)结用作反馈电容器。在用作放大器时,包含另一个区域的区域是源极,由另一个区域形成的反向偏置结用作与栅极绝缘层平行的保护二极管。

著录项

  • 公开/公告号ES366200A1

    专利类型

  • 公开/公告日1971-03-16

    原文格式PDF

  • 申请/专利权人 N. V. PHILIPSGLOEILAMPENFABRIEKEN;

    申请/专利号ES19690366200

  • 发明设计人

    申请日1969-04-18

  • 分类号H01B;

  • 国家 ES

  • 入库时间 2022-08-23 10:06:41

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