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method for the insertion of diffuse in gallium arsenide and zinc halfgeleiderinrichting produced by application of this method.
method for the insertion of diffuse in gallium arsenide and zinc halfgeleiderinrichting produced by application of this method.
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机译:扩散法插入砷化镓中,并应用该方法制得富锌半缩醛。
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1,227,985. Alloys; coating by vapour deposition. WESTERN ELECTRIC CO. Inc. May 24, 1968 [May 31, 1967], No.24994/68. Headings C7A and C7F. [Also in Division H1] A source for diffusing Zn into GaAs consists of a composition falling within the triangular area A formed by joining the following points in the Zn-Ga-As ternary phase diagram:- 1% Zn, 49% Ga, 50% As 59% Zn, 1% Ga, 40% As 33% Zn, 1% Ga, 66% As where the proportions are in atomic percentage. Diffusion may be effected by sealing a GaAs body (single-crystal, 100 oriented, Te-doped, in the example) and the diffusion source in an evacuated chamber and heating to 500‹-744‹C. Resulting junctions may be used in such semi-conductor devices as electro-luminescent diodes, Impatt diode oscillators, varactors, switching diodes, and laser modulators.
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机译:1,227,985。合金;通过气相沉积涂覆。 WESTERN ELECTRIC CO。Inc. 1968年5月24日[1967年5月31日],第24994/68号。标题C7A和C7F。 [还在H1区] Zn扩散到GaAs中的源由落在三角形区域A中的成分组成,该区域是通过将Zn-Ga-As三元相图中的以下点结合而形成的:-1%Zn,49%Ga,50作为原子百分比的比例,以%计为59%Zn,1%Ga,40%为33%Zn,1%Ga,66%As。可以通过在真空室内密封GaAs体(单晶,<100>取向,掺Te)和扩散源并加热至500-744℃来实现扩散。所得结可用于诸如电致发光二极管,Impatt二极管振荡器,变容二极管,开关二极管和激光调制器之类的半导体器件。
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