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Impurity concentration profile for semiconductor - low resistance base has low and high impurity concentration layers

机译:半导体的杂质浓度分布-低电阻基底具有低和高杂质浓度层

摘要

The semiconductor has four or more layers and is formed from a monocrystalline element. The layers are alternate p and n types and a low resistance base has a low (11) and high (12) active impurity concentration layers. The low concentration layer contacts a high resistance base (2) at the side where its impurity concentration gradient is a minimum and its number of impurities is equal to the number in the high resistance base. The zone of the high concentration layer (12) where it contacts the emitter layer (3) has an impurity concentration at least one fiftieth the superficial impurity concentration of the emitter layer. The other side of high concentration layer has an impurity concentration gradient greater than 108 per cubic cm.
机译:半导体具有四层或更多层并且由单晶元素形成。这些层是交替的p和n型,低电阻基极具有低(11)和高(12)活性杂质浓度层。低浓度层在其杂质浓度梯度最小并且其杂质数量等于高电阻衬底中的数量的一侧接触高电阻衬底(2)。高浓度层(12)与发射极层(3)接触的区域的杂质浓度至少是发射极层的表面杂质浓度的五十分之一。高浓度层的另一侧具有大于108 /立方厘米的杂质浓度梯度。

著录项

  • 公开/公告号FR2248611A1

    专利类型

  • 公开/公告日1975-05-16

    原文格式PDF

  • 申请/专利权人 CKD PRAHA NPCS;

    申请/专利号FR19730037478

  • 发明设计人

    申请日1973-10-19

  • 分类号H01L11/10;

  • 国家 FR

  • 入库时间 2022-08-23 03:45:55

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