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process for the manufacture of a photo electric cell and a photoelectric in direction and photo electric generator.
process for the manufacture of a photo electric cell and a photoelectric in direction and photo electric generator.
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机译:光电电池和光电方向性光电发电机的制造方法。
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1532616 Electro-depositing semi-conductors MONOSOLAR Inc 30 May 1977 [8 June 1976] 22719/77 Heading C7B [Also in Division H1] A semi-conductor voltaic cell is made by electrolytic deposition of a transparent semi-conductor compound of Cd, Zn or Hg with S, Se or Te, optionally doped with In, Ga, Al, As, P or Sb, these components coming from the bath via added compound(s) and/or soluble anode. A Schottky barrier is formed on a metallic substrate, or an n-p junction formed by deposition of two different semiconductor types in separate steps by the alteration of electrolytic conditions and/or ratio of depositable substances. The finished cell may include a transparent glass or acrylic base 58 bearing in succession a matrix 62, 64 of conductor, a transparent (Sbdoped S n O 2 or Sn-doped InO 2 ) conductor layer 66, the electro-deposited semi-conductor layers 70, 72 and an internally reflecting metal layer 76. Layers 66 and 70 are of the same conductivity type. A hetero- or homojunction may be produced.
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机译:1532616电沉积半导体MONOSOLAR Inc 1977年5月30日[1976年6月8日]税号C7B [也在H1分部中]通过电解沉积Cd,Zn的透明半导体化合物制成的半导体伏打电池或含有S,Se或Te的Hg或Hg(可选地掺有In,Ga,Al,As,P或Sb),这些成分通过添加的化合物和/或可溶阳极从熔池中流出。肖特基势垒形成在金属基板上,或者通过改变电解条件和/或可沉积物质的比例,通过在单独的步骤中沉积两种不同的半导体类型而形成的n-p结。成品电池可包括透明玻璃或丙烯酸基体58,其依次具有导体的基体62、64,透明的(Sb掺杂的S n O 2或Sn掺杂的InO 2)导体层66,电沉积的半导体层70、72和内部反射金属层76。层66和70具有相同的导电类型。可以产生异质结或同质结。
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