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Production of thin, stable, solid electrolyte films of high ionic conductivity

机译:生产高离子传导率的稳定,稳定的固体电解质薄膜

摘要

Production of thin stable films of oxy-anion-substituted silver iodide solid electrolytes, such as Ag.sub.19 I.sub.15 P.sub.2 O. sub.7, on a substrate, such films having good ionic conductivity at room temperature, by vaporizing such oxy-anion-substituted silver iodide elecytrolyte material, or a mixture of the components thereof in stoichiometric proportions, by flash evaporation of such electrolyte material at high temperature, preferably ranging from about 1,400° to about 1,600. degree. C., or by RF sputtering, preferably at electrode potentials ranging from about 700 to about 900 volts, and maintaining the substrate on which the solid electrolyte film is deposited, at certain elevated temperatures, preferably ranging from about 140° to about 150. degree. C., to permit recombination and deposition of the vaporized constituents of the electrolyte material on the substrate, to form a thin film of the solid electrolyte such that the solid electrolyte film thus formed is neither iodine-rich nor iodine-poor, relative to the proper stoichiometry for such solid electrolyte.
机译:在基板上生产氧阴离子取代的碘化银固态电解质(如Ag.sub.19 I.sub.15 P.sub.2 O.sub.7)的稳定薄膜,这种薄膜在室温下具有良好的离子导电性在室温下,通过将这种电解质材料在高温下,优选在约1,400°至约1,600的温度范围内进行快速蒸发,通过蒸发这种氧阴离子取代的碘化银碘化锂电解质材料或其组分的混合物以化学计量的比例。度。或通过RF溅射,优选在约700至约900伏的电极电势下,并在一定高温下,优选在约140°至约150度的范围内,保持其上沉积有固体电解质膜的基材。 。 C.,以允许电解质材料的汽化成分在衬底上重组和沉积,以形成固体电解质的薄膜,使得相对于电极,由此形成的固体电解质膜既不富碘也不贫碘。这种固体电解质的化学计量比正确。

著录项

  • 公开/公告号US4105807A

    专利类型

  • 公开/公告日1978-08-08

    原文格式PDF

  • 申请/专利权人 UNICAN ELECTROCHEMICAL PRODUCTS LTD.;

    申请/专利号US19750599897

  • 发明设计人 MULK R. ARORA;

    申请日1975-07-28

  • 分类号C23C15/00;C23C11/08;

  • 国家 US

  • 入库时间 2022-08-22 21:27:16

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