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An aqueous acid baths of rhodium and compositions of these baths containing rhodium

机译:铑的含水酸浴和这些包含铑的浴的组成

摘要

P baths of electrolytic deposition of rhodium and composition containing them. / p & & p & these aqueous baths acids of the coating of rhodium comprise 0,1 to 30 g / l of rhodium, 0,1 to 20 g / l of a polycarboxylic organic carboxylic acid containing at least one amino group, and 10 to 100 g / l of radicals orthophosphates, the bath having a ph of 0,1 to 2,0. / p & & p & the present invention is particularly useful for supplying coating baths of rhodium, where the content of rhodium is maintained at a low value, while providing an electrolytic deposit a brilliant. / p
机译:电解沉积铑的

浴和包含它们的组合物。 & &这些铑涂层的水浴酸包括0.1至30g / l的铑,0.1至20g / l的包含至少一个氨基的多元羧酸有机羧酸和10至100g / l的铑。自由基正磷酸盐,浴液的pH值为0.1至2.0。 & &本发明对于提供铑的镀液特别有用,在该镀液中,铑的含量保持在低值,同时提供了良好的电解沉积。

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