PROCESS FOR FORMING A DEFECT-FREE PHOTOMASK OR REPAIRING DEFECTS IN AN EXISTING PHOTOMASK AND PRODUCT THEREOF

摘要

A process for forming a defect-free photomask consisting of an opaque layer overlying a transparent substrate or for repairing transparent defects in an opaque layer (chromium film) overlying a transparent substrate which process comprises applying a coating material (coating material) which absorbs radiant energy to the surface of the substrate, directing a beam of radiant energy (laser) through the substrate onto the coating material at points to be made opaque so as to fuse the coating material and the substrate at their interface thereby forming an opaque layer (treated area) on said substrate, and removing from the surface the unfused coating material (residue).