PROCESS FOR FORMING A DEFECT-FREE PHOTOMASK OR REPAIRING DEFECTS IN AN EXISTING PHOTOMASK AND PRODUCT THEREOF

摘要

A method of forming a photomask without defect consisting of an opaque layer overlying a transparent substrate or repair of transparent defects in an opaque layer (chromium film) overlying a transparent substrate, which method comprises applying a coating material (material coating) which absorbs the radiant energy on the surface of the substrate, directing a radiant energy beam (laser) through the substrate to the coating material at points to be rendered opaque so as to fuse the material coating and the substrate at their interface to form an opaque layer (treated area) on the substrate, and removing from the surface the coating material non merges (residue).