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HIGH SATURATION MAGNETIZATION AND HIGH PERMEABILITY MAGNETIC FILM

机译:高饱和磁化率和高磁导率磁膜

摘要

PURPOSE:To obtain the magnetic film having high saturation magnetization and high permeability characteristics required for forming a thin-film magnetic head by bringing Zr and Co in a magnetic substance material consisting of Zr and Co to a specific composition ratio. CONSTITUTION:A target, which consists of Zr and Co and contains 4.5- 15atom% Zr, is used, opposite substrates are sputtered under the state in which the substrates are kept at a low temperature (100 deg.C or less), and the magnetic films consisting of amorphous Zr and Co and formed on the insulating substrates such as alumina. A magneto-static field of 50 oersted or more is applied to a film surface during coating. The magnetic film is thermally treated in a revolving magnetic field, and permeability is improved. When the quantity of Zr added is increased, the saturation magnetization of the magnetic film reduces, and resistivity rho increases.
机译:目的:通过使由Zr和Co组成的磁性物质中的Zr和Co达到特定的组成比,来获得形成薄膜磁头所需的具有高饱和磁化强度和高磁导率特性的磁性膜。组成:使用由Zr和Co组成并包含4.5-15%原子%Zr的靶材,在将衬底保持在低温(100℃或更低)的状态下溅射相对的衬底,并且由非晶态Zr和Co组成的磁性膜,形成在诸如氧化铝的绝缘基板上。在涂覆过程中,将50奥斯特或更高的静磁场施加到膜表面。在旋转磁场中对磁性膜进行热处理,并提高了导磁率。当添加的Zr的量增加时,磁性膜的饱和磁化强度减小,并且电阻率rho增大。

著录项

  • 公开/公告号JPS59125607A

    专利类型

  • 公开/公告日1984-07-20

    原文格式PDF

  • 申请/专利权人 FUJITSU KK;

    申请/专利号JP19820233130

  • 发明设计人 HATA KUNIO;TAKAHASHI YOSHIO;

    申请日1982-12-24

  • 分类号G11B5/31;C23C14/14;H01F10/12;H01F10/13;H01F10/16;

  • 国家 JP

  • 入库时间 2022-08-22 09:40:23

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