DISAZO COMPOUNDS WATER-SOLUBLE COPPER COMPOUNDS, PROCESS FOR THEIR PREPARATION, ITS APPLICATION, PROCESS FOR DYING OR STAMPING MATERIAL CONTAINING HYDROXY AND / OR CARBONAMIDE GROUPS, OF PREFERENCE OF FIBER MATERIAL, AND DYING PREPARATION

摘要

1. Water-soluble copper-complex disazo compounds of the general formula (1) see diagramm : EP0103156,P35,F1 in which : D is a benzene nucleus in which the substituent R**1 represents a sulfo group or a carboxy group, R**2 represents a hydrogen atom, a sulfo group, a carboxy group, an alkyl group of 1 to 4 C-atoms, an alkoxy group of 1 to 4 C-atoms, a chlorine atom, a bromine atom, an alkanoylamino group of 2 to 5 C-atoms or a benzoylamino group and R**3 represents a hydrogen atom, an alkyl group of 1 to 4 C-atoms, an alkoxy group of 1 to 4 C-atoms or a chlorine atom, or D is a naphthalene nucleus in whihc the substituent R**1 represents a sulfo group and R**2 and R**3 each represent a hydrogen atom or a sulfo group, it being possible for R**1, R**2 and R**3 in all cases to have meanings which are identical with one another or different from one another ; M is a hydrogen atom or the equivalent of an alkali or alkaline earth metal or of a trivalent metal of the third main group ; R' is a hydrogen atom or a sulfo group which can be attached in the 5-, 6-, 7- or 8-position of the naphthol radical ; R* is a group of the general formula (2) see diagramm : EP0103156,P36,F2 which is attached in the 5-, 6-, 7- or 8-position of the naphthol radical and in which R is a hydrogen atom or an alkyl group of 1 to 6 C-atoms which can be substituted by a hydroxy group, a sulfo group or an acylated hydroxy group, A is a phenylene radical which can be substituted by one or two substituents belonging to the group comprising alkyl of 1 to 4 C-atoms, alkoxy of 1 to 4 C-atoms, chlorine, bromine, carboxy and sulfo, or is a naphthylene radical which can be substituted by a sulfo group, and Y represents the vinyl group or a group of the formula -CH2 -CH2 -Z in which Z denotes a substituent which can be eliminated under alkaline conditions, but disclaimed are compounds of the general formula (1) in which, at the same time, D denotes a benzene nucleus and R**1 and R**2 are both sulfo groups located in the para-position relative to one another and R' denotes a sulfo group located in the 5-position of the naphthol radical and R* denotes a group of the general formula (2) located in the 6-position of the naphthol radical.