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PLATING HINDERING PHOTOSETTING RESIN COMPOSITION

机译:涂布后的光固性树脂组合物

摘要

PURPOSE:To enable sufficient plating hindrance and to prevent film defects by incorporating an org. compd. having a thio or dithio group in a specified UV- hardenable type resin compsn. CONSTITUTION:An intended resin compsn. consists of the first unsatd. compd. having =2 terminal double bonds for forming the skeleton of this compsn. upon being hardened, such as a novolak type epoxy acrylate represented by formula I ; the second unsatd. compd. having a terminal double bond, such as a bisphenol A type epoxy (meth)acrylate represented by formula II, R being H or methyl; a photopolymn. initiator; and an org. compd. having a thio or dithio group, such as mercaptan or thioester. The resin compsn. to be partially soldered is coated with said compsn. on the parts to be masked, resulting in inhibiting an undercoating material from attaching to the parts to be masked and hindering plating. Since this compsn. is freed from solvent, and pinholes are prevented, good partial plating can be executed.
机译:目的:通过加入有机硅来提供足够的电镀障碍并防止膜缺陷。补偿。在特定的UV可硬化型树脂组合物中具有硫代或二硫代基团。组成:预期的树脂成分。由第一个不饱和的组成。补偿。具有> = 2个末端双键以形成该复合物的骨架。固化后,例如由式I表示的线型酚醛清漆型环氧丙烯酸酯;第二个不满意。补偿。具有末端双键的,例如由式II表示的双酚A型环氧(甲基)丙烯酸酯,R为H或甲基;光聚合物。发起人和一个组织。补偿。具有硫或二硫基的基团,例如硫醇或硫酯。树脂成分。待部分焊接的表面涂有上述化合物。在要被掩盖的零件上的涂层,会抑制底涂层材料附着在要被掩盖的零件上并阻碍电镀。既然这个。去除溶剂,防止针孔,可以进行良好的局部电镀。

著录项

  • 公开/公告号JPS60121443A

    专利类型

  • 公开/公告日1985-06-28

    原文格式PDF

  • 申请/专利权人 SONY KK;

    申请/专利号JP19830229685

  • 申请日1983-12-05

  • 分类号G03C1/00;C23C18/16;C23C18/31;C25D5/02;G03F7/004;G03F7/085;

  • 国家 JP

  • 入库时间 2022-08-22 08:34:30

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